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Lyncée Tec DHM R-series 반사형 디지털 홀로그래픽 현미경 DHM
Patented reflection digital holographic microscope, sub-nanometric vertical resolution, digital post-focusing.
특허 반사형 디지털 홀로그래픽 현미경, 서브 나노 수직 분해능, 디지털 후처리 초점.
Description
The DHM® – R series is a reflection configured Digital Holographic Microscope (DHM®), providing a non-scanning and non-contact method for static and dynamic 3D topography as well as vibration characterization. It measures the 3D topography map of a surface with a single acquisition, without any scanning mechanism required. It provides unbeatably fast acquisition, at camera rates of up to 100,000 fps, enabling routine inspections with high productivity and the capture of 3D topographies on the production line without stopping the sample.
The vertical calibration of DHM is intrinsically defined by the laser wavelength, providing high accuracy, reproducible data, and a subnanometric vertical resolution. Thanks to advanced numerical processing of the recorded hologram, sharp focus can be performed simultaneously or after measurement as post-processing, without manually adjusting the height of the sample.
DHM-R measuring through a glass window
Three configurations are available based on the number of wavelengths:
- R1000 models: Configured with a single wavelength; the ideal tool for measuring smooth surfaces and vibrations.
- R2100 models: Configured for measuring simultaneously at two wavelengths for achieving measurement of complex or discontinuous structures.
- R2200 models: R2100 with a third source to extend measurement capability, in particular for measuring transparent patterns.
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- Single wavelength configuration
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- Dual wavelengths configuration
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- 3 wavelengths configuration
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Applications
- MEMS Analysis up to 25 MHz: Out-of-plane vibration amplitude resolution of 5pm and in-plane displacement resolution of 1nm using an optional stroboscopic unit. It provides a time-sequence of 3D topographies, frequency resonances, and responses.
- Deformable & Soft Samples: Study of the 3D dynamic behavior of deformable samples and topography of soft materials and liquids.
- Large Surface Screening: Fast screen and analysis of large surfaces.
- Controlled Environmental Measurements: Measurements through glass and immersion liquids, or inside environmental and vacuum chambers under controlled temperature, humidity, pressure, or gas composition.
- Transparent Patterns & Multi-layers: Measurement of the topography of transparent structures, thicknesses, and refractive index values of structured multi-layers ranging from 10 nanometers to tens of microns.
Time sequence of 3D topographies, limited by camera rate : evaporation of a liquid drop
Specifications
| System | R1000 | R2100 | R2200 |
|---|---|---|---|
| DHM models | R1000 | R2100 | R2200 |
| Number of laser sources | 1 | 2 | 3 |
| Operating wavelength (±1.0 nm) | 675 nm | 675 nm, 794 nm | 666 nm, 794 nm, 675 nm |
| Laser wavelength stability | 0.01 nm/°C at 675 nm | ||
| Sample stage | Manual or motorized XYZ stages up to 300 mm × 300 mm × 38 mm travel range | ||
| Objectives | Magnification 1.25× to 100×, standard, high NA, long working distance, water/oil immersion | ||
| Objective turret | 6 positions | ||
| Computer | Workstation with latest multicore Intel® processor, high performance graphic card, min. 21″ screen | ||
| Software | Proprietary Koala software based on C++ and .NET; optional advanced analysis modules | ||
| Data compatibility | Bin format; exportable as .txt, .tif | ||
| Performance | |||
| Measurement mode | Single wavelength at 675 nm | Short synthetic wavelength at 4.4 µm | Long synthetic wavelength at 50 µm |
| Applicable models | R1000, R2100, R2200 | R2100, R2200 | R2200 |
| Accuracy [nm] | 0.15 | 0.15 / 3.0 * | 20 |
| Vertical resolution [nm] | 0.30 | 0.30 / 6.0 * | 40 |
| Repeatability [nm] | 0.01 | 0.01 / 0.1 * | 0.5 |
| Vertical measuring range | Up to 200 µm | ||
| Max. step height (sharp edges) | Up to 333 nm | Up to 2.1 µm | Up to 24 µm |
| Vertical calibration | Determined by interferometric optical filter, ±0.1 nm | ||
| Acquisition time | Standard: 500 µs (optional: 10 µs) | ||
| Acquisition rate | Standard: 190 fps at 1024×1024 pixels (optional: up to 100,000 fps) | ||
| Lateral resolution | Objective-dependent, down to 300 nm | ||
| Min. sample reflectivity | Less than 1% | ||
| Hardware | |||
| Input voltage | 85–260 VAC, 50/60 Hz | ||
| Max. power | 250 W | ||
| Dimensions (L×W×H) | 600 × 600 × 800 mm | ||
| Weight | 48 kg | ||
1 As demonstrated by taking the temporal standard deviation on 1 pixel over 30 measurements
2 Defined as twice the accuracy
3 As demonstrated by taking the one sigma Rq value of 30 repeatability measurements without sample
4 Depends on the laser source(s) and operating wavelength(s)
* With / Without single wavelength mapping
** Objectives specifications on www.lynceetec.com/microscope-objectives
Options
- Objectives with extra-LWD, cover-glass correction, for immersion, etc.
- Motorized stage for automation and stitching
- Remote TCP/IP module for automation and remote control of DHM
- Stroboscopic unit for MEMS analysis
- Environmental chamber for measuring under controlled conditions
