Litho Maskless 마스크리스 리소그래피 Maskless Lithography
Litho Maskless 마스크리스 리소그래피 Maskless Lithography - Image 2
Litho Maskless 마스크리스 리소그래피 Maskless Lithography - Image 3

Litho Maskless 마스크리스 리소그래피 Maskless Lithography

DMD-based maskless lithography module for optical microscopes, 405 nm, CD 1.65 µm

광학현미경 장착형 DMD 마스크리스 리소그래피, CD 1.65 µm

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Description

LITHO MASKLESS is a maskless lithography system that attaches directly to a standard optical microscope, enabling high-resolution photolithography without physical masks. Engineered by Planck Inc. and distributed by CALI.

LITHO MASKLESS는 일반 광학현미경에 직접 장착하는 마스크리스 리소그래피 시스템으로, 물리적 마스크 없이 고해상도 포토리소그래피를 구현합니다.

Key Features

  • 0.65″ DMD (1920×1080) pattern generator — no photomask required
  • 마스크 없는 DMD 기반 패턴 생성 — 포토마스크 불필요
  • AIUniBeam™: AI-based beam uniformity compensation achieving >90% uniformity
  • AIUniBeam™: AI 기반 빔 균일도 보정으로 90% 이상 균일도 달성
  • Easyalign™: Camera-based pattern alignment and simulation overlay
  • Easyalign™: 카메라 기반 패턴 정렬 및 시뮬레이션 오버레이
  • Compatible with Olympus BX, Nikon Eclipse, and Thorlabs Cerna microscope series
  • Olympus BX, Nikon Eclipse, Thorlabs Cerna 현미경 시리즈와 호환
  • Multiple wavelengths: 365 nm / 385 nm / 405 nm
  • 다중 파장 지원: 365 nm / 385 nm / 405 nm
  • Max intensity: 1.3 W/cm², radiometric flux 4 W
  • 최대 광강도 1.3 W/cm², 복사 플럭스 4 W
  • Compact plug-and-play module; USB 2.0 + HDMI output
  • 컴팩트 플러그앤플레이 모듈; USB 2.0 + HDMI 출력

AlUniBeam™ is Al-based beam uniformity compensa-
tion technology using a beam profiler. The beam profiler
measures the intensity of every pixel and then compen-
sates and optimizes the local intensity using pixel con-
trol to satisfy over 90% uniformity.

Easyalign™ is pattern alignment or simulation technol-
ogy using a camera system. LITHO Maskless software can overlay the expected pattern image on the camera
view to align the pattern or simulate the expected pattern on the substrate.

Applications

  • Microelectronics and MEMS device fabrication
  • 마이크로일렉트로닉스 및 MEMS 소자 제작
  • Photonic device and waveguide patterning
  • 광소자 및 도파로 패터닝
  • Microfluidics and lab-on-chip fabrication
  • 미세유체 및 랩온칩 제작
  • Rapid prototyping of micro/nano structures
  • 마이크로/나노 구조 신속 프로토타이핑
  • University research and shared instrumentation centers
  • 대학 연구실 및 공동기기원

Pattern Specifications

Parameter 5x 10x 20x 50x 100x
NA 0.15 0.3 0.4 0.6 0.8
Pattern Size (µm) 2903×1633 1452×816 726×408 290×163 145×82
CD (µm) 3.29 1.65 1.24 0.82 0.62

* Specs from demo version system (Nikon Eclipse LV100). CD is estimated value at 405 nm. System optimized for 10x objective lens.

Compatible Microscopes

Brand Series
Olympus BX series
Nikon Eclipse series
Thorlabs Cerna series

 

Specifications

Parameter Specification
Pattern Generator 0.65″ DMD
Pattern Pixels 1920 × 1080
Radiometric Flux 4 W
Wavelength 365 nm / 385 nm / 405 nm
Intensity Max 1.3 W/cm²
Uniformity >90%
Camera 1/1.8″ CMOS sensor
Ports USB 2.0, HDMI
Power 110 V or 220 V, 60 W
Data Format PNG
Operating OS Windows 10 or 11
Compatible Microscopes Olympus BX series, Nikon Eclipse series, Thorlabs Cerna series
*The specifications is from demo version system (Nikon Eclipse LVI00)
*CD(Critical Dimension) is estimated value at 405nm
*LITHO MASKLESS is optimzed in 10x objective lens system

📎 원본 제품 페이지 (Standard Science)

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